New metrology and inspection era: 1+1=3?

New system architecture as well as continuous scaling are important pillars of advanced semiconductor research and development, and both bring new challenges to today’s metrology and inspection techniques. In parallel, improved process control comes with tighter specifications and therefore reduced metrology budget. Conventional metrology approaches cannot alone cope with this ever increasing demand for performance and a new approach has to be considered. This presentation will explore the importance of metrology solutions and what a realistic implementation could be to ensure the success of advanced semiconductor R&D efforts.