Christophe Fouquet - ASML

CBO & Board of Management, ASML

Extending lithography into the next decade to support our society endless needs for sustainable semiconductor technologies
Our world is changing fast, and our industry ability to continue to provide cost effective, performant and sustainable technologies is more than ever a positive opportunity for this change. At ASML we continue to pursue our vision of unlocking the potential of people and society by pushing technology to new limits. Together with our partners, we provide leading lithographic and patterning solutions that drive the advancement of microchips. ASML’s pursuit of Moore’s Law will continue to drive innovations to achieve increased performance and sustainability  while reducing cost across an increasing range of applications. Our extended holistic EUV lithography roadmap continues to deliver higher transistor density at reduced complexity, cost and energy while our continuous effort to improve all our products results in supporting effectively the increased need for large volume of chips. ASML holistic lithography roadmap can now extend far into the next decade with major innovations in EUV, DUV, metrology, patterning models and control.