Anne-Laure Charley

Anne-Laure Charley owns a PhD in physics of semiconductor from INPG (Institut national polytechnique de Grenoble, France) specialized in lithography and optic for semiconductor (graduated in 2006). She started her career as lithography R&D engineer at STMicroelectronics (France) and at Crocus Technology (San Jose, USA). She joined imec in 2008 as researcher in metrology for advanced patterning applications. She became R&D team leader in the field of CD metrology in 2015 and is now managing the inline metrology and inspection group in the advanced patterning department.