Geert Vandenberghe

Geert Vandenberghe received his MSc and PhD degree from the Katholieke Universiteit of Leuven in Belgium and is SPIE Fellow.

In 1995 he joined the Lithography Department at imec where he has been working in different roles and various areas such as resists, patterning, imaging, OPC, resolution enhancement techniques, and on various wavelengths ranging from 248nm, over 193nm and immersion to 13.5nm, all in the framework on imec’s Advanced Lithography Research Programs at imec. Currently he is VP Patterning Technology Programs, which is including the imec-ASML joint High NA EUV Lab.